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ASML, imec set up new high-NA optics lab for EUV lithography

October 23, 2018

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Engineers at the Belgian electronics research center imec and lithography equipment giant ASML are establishing a new laboratory to accelerate the development of next-generation extreme ultraviolet (EUV) optics for patterning semiconductor chips.

Part of a wider collaboration between the two that has already run for three decades, the high-numerical aperture (high-NA) EUV laboratory will aim to shrink device features beyond even what is possible with the current, initial generation of EUV equipment.

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